Fab Lab lithography instrument now available for high-res imaging

news story image

The FABLAB announces that the Raith e_LiNE system is now available for imaging purposes in addition to electron beam lithography duties! The Raith offers much higher resolution than other campus SEMs.

The rate to use the tool in this way will be the same as its E-beam writing rate.  For more information on our rates, see https://www.nanocenter.umd.edu/facilities/rates/

If you are already trained on the e_LiNE you are free to image; if you need training, Jon Hummel is available for that.

We will be making additions in the next few months to the tool that allow for increased user ease of operation such as a knob set and more variety in sample mounting configurations.


John Abrahams
University of Maryland Nanocenter
Acting FABLAB Director
Kim Engineering Building (KEB) #225
8228 Paint Branch Drive
College Park, Maryland 20742
Room 2304
Office 301-405-6664
FAX   301-314-1348
Some technical information on the e-LiNE:

The Raith e_line is a versatile e-beam system for nano structuring, patterning  and imaging using a Thermal Field Emission filament for ultra high resolution capability.   Patterns can be done in either stitching mode or "Fixed Beam Moving Stage" mode. FBMS eliminates stitching errors on larger structures such as waveguides that can range over multiple millimeter distances.  The electron column has a unique cross over free-beam path that give high beam current and exceedingly low aberrations for top quality patterning and unsurpassed low voltage imaging even below 1keV.

Published January 3, 2019