MSE Seminar: Dr. Gottlieb Oehrlein, UMD
Wednesday, October 25, 2023
Room 2108 Chemical and Nuclear Engineering Building
Low temperature plasma-materials interactions: Foundations of nanofabrication and emerging applications at atmospheric pressure
Abstract: Our ability to understand and control the interactions of non-equilibrium plasma with surfaces of materials has been an exciting frontline that has enabled the realization of new applications and technologies. The plasma-material interactions (PMI) field has grown rapidly because of a number of reasons. First, plasma-assisted etching (PE) is one of the foundations of micro- and nanofabrication where increasingly atomistic precision in materials processing is required. By enabling the realization of intricate material features that semiconductor circuits and microstructures consist of, PE makes possible our technological tools, and thus modern society. This exceedingly complex procedure begins with the transfer of a resist mask in a directional and chemically selective fashion into various materials. Controlling profile shape, critical dimensions, surface roughness, and electrical integrity are crucial, and determined by PMI. Second, development of novel low temperature plasma sources operating at atmospheric pressure has enabled advances in areas where use of PMI has historically been limited, e.g. biology, catalysis and others. I will present a brief review of recent contributions to our understanding of PMI, in particular to advances in plasma etching processes that are impacting current semiconductor fabrication approaching the atomic scale, and interaction of low temperature atmospheric pressure plasma sources with catalysts.